邱曉燕

2017/07-2017/09香港理工大學應用物理系 Senior Visiting Scholar

2014/07-2014/09香港理工大學應用物理系 Research Fellow

2012/08-2013/08美國德州大學聖安東尼奧分校 Visiting Scholar

2006/08-2007/01香港理工大學應用物理系 Research Assistant

在納米介電功能薄膜與器件方面發表SCI科研論文30餘篇，先後主持國家和省部級科研項目7項，Adv.Funct.Mater.Applied physics letter，J.Applied physics,Chin.Phys.Lett.學術期刊審稿人。國家自然科學基金委，重慶市科委基金通訊評審專家，廣西自然科學基金委特邀評審專家。

主要從事納米電介質薄膜，氧化物薄膜鐵磁性研究。先後主持各類科研課題多項，在國內外學術刊物上發表SCI收錄論文近20篇。

主要承擔《力學》《理論力學》等課程的教學任務。

科研項目

(01)高介電柵介質材料鉿鋁酸鹽薄膜的製備和界面性質研究：重慶市自然科學基金（CSTC2007BB4352），主持，2007.07-2009.07.

(02)高介電常數柵介質材料鉿鋁酸鹽薄膜的製備和界面性質研究：西南大學博士基金項目(SWUB2007007),主持，2007.04-2009.04.

(03)師範類專業重點課程《力學》數字化建設：西南大學教育教學改革研究項目，主持，2009.09-2010.04.

(04)物理專業免費師範生創新性課堂教學改革研究：西南大教育教學改革研究項目，主持，2010.01-2012.12.

(05)HfAlOx介電薄膜d0鐵磁性與介電性的集成可行性探究：國家青年基金項目(國家自然科學基金委10904124)，主持，2010.01-2012.12.

(06)納米微粒光性質研究：教育部青年骨幹教師資助項目(教技司[2000]65)，主研，2000.9-2003.9，

(07)網路環境下物理免費師範生特色課堂教學研究：重慶市教育委員會，主持，2011.1-2012.12

代表論文

[1]X.Y.Qiu(邱曉燕)，G.D. Zhou , J. Lia, Y. Chen, X.H. Wang, J.Y. Dai，Memory characteristics and tunneling mechanism of Ag nanocrystal embedded HfAlOx films on Si83Ge17/Si substrate，Thin Solid Films，2014(562): 674–679

[2]X.Y.Qiu(邱曉燕)，J. Li , P. Chen , Y. Zhang , Y. T. Tu , X. H. Wang W. Lu, Post-annealing treatments and interface effects on anomalous magnetic characteristics of HfOx film, Integrated Ferroelectrics: An International Journal, 2013(141): 145-153

[3]Z.J.Liu,S.Y.Zhang,J. Q. Huo, J. Li, X. Y. Qiu (邱曉燕，通訊作者)，Effect of HfOx buffer layer on the resistive switching characteristics of g-Fe2O3 nano-particle films (in Chinese). Sci Sin-Phys Mech Astron, 2014, 44: 417–424.

[4]G.D.Zhou,S. Y. Zhang, Y. T. Tu, J. Li, P. Chen, J. Y. Dai, and X. Y. Qiu (邱曉燕，通訊作者)，Anisotropy of Weak Ferromagnetism of HfAlOx Film Deposited by Magnetron Sputtering，Integrated Ferroelectrics, 2012(134): 13-15

[5]Y.T.Tu,G. D. Zhou, J. Y. Dai, J. Li, P. Chen, and X. Y. Qiu (邱曉燕，通訊作者).Weak Ferromagnetism of HfO2 Film on Compressively Strained Si83Ge17/Si Substrate, Integrated Ferroelectrics, 2012(134): 10-12

[6]S.Y.Zhang,G. D. Zhou, Z. J. Liu, X. Y. Qiu (邱曉燕，通訊作者). Microstructures, interfacial reactions and dielectric properties of HfAlOx film on compressively strained Si83Ge17/Si substrate (in Chinese). Sci Sin-Phys Mech Astron, 2012(42): 1338–1345

[7]G.D.Zhou,X. F. Chen, Y. T. Tu, S. Y. Zhang, Z. J. Liu, J. Li, P. Chen, X. Y. Qiu (邱曉燕，通訊作者).Weak ferromagnetism of HfOx films deposited by sputtering in different depositing/annealing ambient (in Chinese). Sci Sin-Phys Mech Astron, 2012(42): 926-933

[8]Y.T.Tu,G. D. Zhou, S. Y. Zhang, J. Li, X. Y. Qiu (邱曉燕，通訊作者). Dielectric properties of HfO2 films deposited on compressively strained Si83Ge17/Si substrate by sputtering (in Chinese). Sci Sin Phys Mech Astron,2012(42): 377-384

[9]X.F.Chen,Y. T. Tu, G. D. Zhou, X. Y. Qiu (邱曉燕，通訊作者). Dielectric properties and interfacial microstructures of HfO2 films deposited in different ambient by sputtering (in Chinese). Sci Sin Phys Mech Astron, 2011(41): 243-248

[10]X.Y.Qiu(邱曉燕), K. C. Chan, P. F. Lee, X. W. Dong and J. Y. Da，Interfacial microstructure and electrical properties of HfAlOx thin films on compressively strained Si83Ge17 grown by RF magnetron sputtering, Microelectronic Engineering,2009 (86): 2247-2250

[11]X.Y.Qiu(邱曉燕), H. W. Liu, F. Fang, M. J. Ha, Z. G. Liu and J.-M. Liu, Interfacial properties of high-k dielectric CaZrOx films deposited by pulsed laser deposition, Applied Physics Letters, 2006 (88): 182907

[12]X.Y.Qiu(邱曉燕), H. W. Liu and J.-M. Liu, Thermal stability and interfacial properties of ZrAlxSiyOz films prepared by pulse-laser deposition, Journal of Applied Physics,2006 (100): 074109

[13]X.Y.Qiu(邱曉燕), H. W. Liu, F. Fang, M. J. Ha, X. H. Zhou, and J. –M. Liu , Thermal stability and dielectric properties of ultrathin CaZrOx films prepared by pulsed laser deposition, Appl. Phys. A Mater. Sci. Proc.2005 (81):1431-1434

[14]X.Y.Qiu(邱曉燕), H. W. Liu, F. Fang, M. J. Ha, and J.-M. Liu , Interfacial microstructure of high-k dielectric CaZrOx films deposited by pulse laser deposition in low oxygen pressure, Integrated Ferroelectrics, 2005(74): 103-111

[15]X.Y.Qiu (邱曉燕), F. Gao, H. W. Liu, J. S. Zhu, and J.-M. Liu, Phase Separation Enhanced Interfacial Reactions in Complex High-k Dielectric Films,Integrated Ferroelectrics,2006 (86):13-19